Filters for semiconductor manufacturing

Filtration for semiconductor manufacturing for processes involved in wafer production.

All standard membranes are supplied;

- hydrophilic PTFE or PVDF

- hydrophobic PTFE

- Nylon 66 or PES

- UPE

The cartridge is made of PP, HDPE or PFA.

Separation capacities range from 1 µm to 3 nm (0.03 µm).

Our company's area of expertise lies in cartridge filters for:

- Photolithography

- Wet Etch and Clean

- CMP

- Bulk chemicals

- DI and UPW water

Although we still define the extractable components in parts per billion (ppb), we are working towards parts per trillion (ppt).

This will be achieved in the near future as users in Korea, Japan and Taiwan are demanding ppt values.

When it comes to CMP filters for CMP slurries, our supplier CSM's expertise is unparalleled. It manufactures the specific polypropylene melt-blown filter media in-house and can configure, combine and optimize them to ensure that CSM's CMP filters can compete with those of any other market leader. Pore sizes range from 40 nanometers (0.04 µm) to 7 micrometers.

We recommend:

• CSM PCP
• CSM UPE
• PTFE